发明授权
US6017814A Structure and fabrication method for stackable, air-gap-containing low epsilon dielectric layers 失效
可堆叠,含气隙的低ε电介质层的结构和制造方法

Structure and fabrication method for stackable, air-gap-containing low
epsilon dielectric layers
摘要:
A structured dielectric layer and fabrication process for separating wiring levels and wires within a level on a semiconductor chip is described incorporating a lower dielectric layer having narrow air gaps to form dielectric pillars or lines and an upper dielectric layer formed over the pillars or fine lines wherein the air gaps function to substantially reduce the effective dielectric constant of the structured layer. The invention overcomes the problem of solid dielectric layers which would have the higher dielectric constant of the solid material used.
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