发明授权
- 专利标题： Alignment system
- 专利标题（中）： 校准系统
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申请号： US766928申请日： 1996-12-16
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公开(公告)号： US6018395A公开(公告)日： 2000-01-25
- 发明人: Makiko Mori , Shunichi Uzawa , Kunitaka Ozawa , Hirohisa Ohta , Noriyuki Nose
- 申请人： Makiko Mori , Shunichi Uzawa , Kunitaka Ozawa , Hirohisa Ohta , Noriyuki Nose
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX1-248139 19890926; JPX1-248140 19890926
- 主分类号： G03F9/00
- IPC分类号： G03F9/00 ; G01B11/00
摘要：
An alignment method useable with an original having a pattern and a substrate having a surface area on which the pattern of the original is printed. The alignment method comprises detecting plural marks, calculating plural times, the amount of rotational deviation on the basis of different combinations of marks, calculating the quantity of rotational correction of the original and the substrate by using the computed rotational deviations, and aligning on the basis of the calculated quantity of the rotational deviation.
公开/授权文献
- US4627310A Ratio speed adaptor 公开/授权日：1986-12-09