发明授权
US6021789A Wafer cleaning system with progressive megasonic wave 失效
具有渐进式超声波的晶圆清洗系统

Wafer cleaning system with progressive megasonic wave
摘要:
Improved megasonic cleaning is obtained by use of an apparatus containing a plurality of transducers arranged to transmit a progressive megasonic wave through a liquid containing a planar surface of an object. The progression of the wave is preferably such that particles are carried by the wave toward the toward the edge of the wafer. The processes and apparatus are especially useful for cleaning wafers in the course of manufacturing integrated circuit chips.
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