发明授权
- 专利标题: Wafer cleaning system with progressive megasonic wave
- 专利标题(中): 具有渐进式超声波的晶圆清洗系统
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申请号: US189429申请日: 1998-11-10
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公开(公告)号: US6021789A公开(公告)日: 2000-02-08
- 发明人: Hiroyuki Akatsu , Soichi Nadahara
- 申请人: Hiroyuki Akatsu , Soichi Nadahara
- 申请人地址: NY Armonk JPX Kawasaki
- 专利权人: International Business Machines Corporation,Kubushiki Kaisha Toshiba
- 当前专利权人: International Business Machines Corporation,Kubushiki Kaisha Toshiba
- 当前专利权人地址: NY Armonk JPX Kawasaki
- 主分类号: B08B3/12
- IPC分类号: B08B3/12 ; H01L21/00 ; H01L21/304 ; B08B3/10
摘要:
Improved megasonic cleaning is obtained by use of an apparatus containing a plurality of transducers arranged to transmit a progressive megasonic wave through a liquid containing a planar surface of an object. The progression of the wave is preferably such that particles are carried by the wave toward the toward the edge of the wafer. The processes and apparatus are especially useful for cleaning wafers in the course of manufacturing integrated circuit chips.
公开/授权文献
- US4836477A Parachute release devices 公开/授权日:1989-06-06
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