- 专利标题: Conductivity modulated MOSFET
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申请号: US104326申请日: 1998-06-25
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公开(公告)号: US6025622A公开(公告)日: 2000-02-15
- 发明人: Akio Nakagawa , Hiromichi Ohashi , Yoshihiro Yamaguchi , Kiminori Watanabe , Thuneo Thukakoshi
- 申请人: Akio Nakagawa , Hiromichi Ohashi , Yoshihiro Yamaguchi , Kiminori Watanabe , Thuneo Thukakoshi
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX59-110244 19840530; JPX59-204427 19840929; JPX59-244811 19841120
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L29/10 ; H01L29/739 ; H01L29/74
摘要:
A conductivity modulated MOSFET, having a semiconductor substrate of a first conductivity type, a semiconductor layer of a second conductivity type formed on the semiconductor substrate and having a high resistance, a base layer of the first conductivity type formed in the semiconductor layer, a source layer of the second conductivity type formed in the base layer, a gate electrode formed on a gate insulating film which is formed on a channel region, the channel region being formed in a surface of the base layer between the semiconductor layer and the source layer, a source electrode ohmic-contacting the source layer and the base layer, and a drain electrode formed on the surface of the semiconductor substrate opposite to the semiconductor layer, characterized in that the conductivity modulated MOSFET has a saturation current smaller than a latch-up current when a predetermined gate voltage is applied to the gate electrode.
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