Invention Grant
US6030451A Two camera diameter control system with diameter tracking for silicon
ingot growth
失效
两个相机直径控制系统,具有硅锭生长的直径跟踪
- Patent Title: Two camera diameter control system with diameter tracking for silicon ingot growth
- Patent Title (中): 两个相机直径控制系统,具有硅锭生长的直径跟踪
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Application No.: US5773Application Date: 1998-01-12
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Publication No.: US6030451APublication Date: 2000-02-29
- Inventor: Aaron LaBrie , Masahiko Baba
- Applicant: Aaron LaBrie , Masahiko Baba
- Applicant Address: WA Vancouver
- Assignee: SEH America, Inc.
- Current Assignee: SEH America, Inc.
- Current Assignee Address: WA Vancouver
- Main IPC: C30B15/26
- IPC: C30B15/26 ; C30B15/22
Abstract:
A method and apparatus for measuring and controlling the diameter of a silicon single crystal ingot grown by the Czochralski technique using dual optical cameras focused on diametrically opposed edges of the meniscus of the growing crystal to measure the actual crystal diameter. The crystal growth parameters can be adjusted in response to the measured diameter to maintain a constant, desired diameter. The method and apparatus of the invention provide a continuous accurate measurement of the crystal diameter and avoid unnecessary adjustments to the crystal growth conditions resulting from diameter measurement errors due to the effects of crystal orbit, melt level changes and camera angle variations.
Public/Granted literature
- USD352965S Desk top file storage rack Public/Granted day:1994-11-29
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