发明授权
- 专利标题: Device for and method of concentrating chemical substances for semiconductor fabrication
- 专利标题(中): 集中化学物质用于半导体制造的装置和方法
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申请号: US974319申请日: 1997-11-19
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公开(公告)号: US6033989A公开(公告)日: 2000-03-07
- 发明人: Yong-woo Her , Heoung-bin Lim , Byoung-woo Son , Mi-kyung Lee
- 申请人: Yong-woo Her , Heoung-bin Lim , Byoung-woo Son , Mi-kyung Lee
- 申请人地址: KRX Suwon
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KRX Suwon
- 优先权: KRX96-60024 19961129
- 主分类号: G01N1/36
- IPC分类号: G01N1/36 ; B01D3/00 ; B01D3/34 ; G01N33/00 ; H01L21/00 ; H01L21/304
摘要:
A device for concentrating chemical substances for use during the fabrication of a semiconductor device uses a sample container for holding chemical substances. A feed tube in gas flow communication with the sample container introduces a carrier gas. A vapor outlet in gas flow communication with the sample container discharges a mixture of a vapor and the carrier gas. A sample heater, disposed above and apart from the sample container, heats the chemical substances to a first predetermined temperature. A gas source supplies the carrier gas, and a gas heater, in gas flow communication with both the gas source and the feed tube, heats the carrier gas to a second predetermined temperature. A condenser in flow communication with the vapor outlet produces a liquid from the vapor, and a collecting container collects the liquid.
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