发明授权
- 专利标题: Structure of electric contact of electrolytic cell
- 专利标题(中): 电解槽电接触结构
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申请号: US128943申请日: 1998-08-05
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公开(公告)号: US6045669A公开(公告)日: 2000-04-04
- 发明人: Shingo Matsumoto , Minoru Yamada
- 申请人: Shingo Matsumoto , Minoru Yamada
- 申请人地址: JPX Tokyo
- 专利权人: Nippon Mining & Metals Co., Ltd.
- 当前专利权人: Nippon Mining & Metals Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 主分类号: C25C7/02
- IPC分类号: C25C7/02 ; C25D17/04
摘要:
The present invention provides a structure of an electric contact of an electrolytic cell, wherein an elongated conductive member is provided as a bus bar 10 on a wall of an electrolytic cell for feeding current to anodes 1 and cathodes 2 arranged in the electrolytic cell; the conductive member 10 forms a convex portion 12 in parallel with the longitudinal direction on the upper surface of an elongated plate member 11 forming a base; and at least the upper surface of the convex portion 12 is totally or partially gold plated 13 in the longitudinal direction.
公开/授权文献
- US5410321A Directed reception pattern antenna 公开/授权日:1995-04-25
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