发明授权
- 专利标题: Substrate heat-treating apparatus
- 专利标题(中): 基板热处理装置
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申请号: US60422申请日: 1998-04-14
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公开(公告)号: US6062852A公开(公告)日: 2000-05-16
- 发明人: Takanori Kawamoto , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Akihiko Morita
- 申请人: Takanori Kawamoto , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Akihiko Morita
- 申请人地址: JPX
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX9-120174 19970422
- 主分类号: H01L21/683
- IPC分类号: H01L21/683 ; F27D5/00 ; H01L21/027 ; H01L21/68
摘要:
A substrate heat-treating apparatus includes a heat-treating plate, and support pins extending through the heat-treating plate to be vertically movable relative thereto. The support pins support each substrate at a lower surface thereof such that edges of the substrate are at a higher level than a central region of the substrate. This construction facilitates air flows into and out of a space between the lower surface of the substrate and the upper surface of the heat-treating plate when the substrate is vertically moved.
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