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发明授权
US06074801A Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same 失效
用于短波长光束的负型光致抗蚀剂组合物及其形成方法

Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same
摘要：
A negative type photoresist composition is composed of a polymer which contains a repetition unit which is expressed by a general chemical formula (1), a crosslinker composed of a compound which contains a functional group which is expressed by a general chemical formula (2), and a photo-acid generator which generates acid in response to a light. The chemical formula (1) is as follows, ##STR1## In this case, R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is an alkylene group containing carbon atoms in a range of 7 to 18 and having a bridged cyclic hydrocarbon group, and a weight average molecule weight of the polymer is in a range of 1000 to 500000. Also, the chemical formula (2) is as follows, ##STR2## In this case, R.sup.8 is a hydrogen atom, an alkyl group containing carbon atoms in a range of 1 to 6 or an oxoalkyl group containing carbon atoms in a range of 3 to 6.
摘要（中）：

负型光致抗蚀剂组合物由含有由通式（1）表示的重复单元的聚合物构成，由含有由通式（2）表示的官能团的化合物构成的交联剂， 以及响应于光而产生酸的光酸发生剂。 化学式（1）如下，在这种情况下，R 1为氢原子或甲基，R 2为碳原子数为7〜18的亚烷基，具有桥连环状烃基， 聚合物的平均分子量在1000〜500000的范围内。此外，化学式（2）如下，在这种情况下，R 8为氢原子，碳原子数为1〜6的烷基 或含有3〜6个碳原子的氧代烷基。

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