发明授权
- 专利标题: Polyhalomethane compound and photosensitive material
- 专利标题(中): 聚卤甲烷化合物和感光材料
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申请号: US827416申请日: 1997-03-27
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公开(公告)号: US6074813A公开(公告)日: 2000-06-13
- 发明人: Naoki Asanuma , Hisashi Okada , Ichizo Toya
- 申请人: Naoki Asanuma , Hisashi Okada , Ichizo Toya
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film, Co., Ltd.
- 当前专利权人: Fuji Photo Film, Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX8-097333 19960328
- 主分类号: G03C1/34
- IPC分类号: G03C1/34 ; G03C1/498
摘要:
A polyhalomethane compound represented by the following formula and a silver halide photosensitive material containing the same are disclosed. ##STR1## (Q.sub.1 represents a 1,2,4-triazole ring, etc., Z.sub.1 and Z.sub.2 each represents a halogen atom, Y represents --SO.sub.2 --, etc., and A represents a halogen atom, etc.)The polyhalomethane compound is useful as a highly active antifoggant which enables photosensitive materials, especially of the heat development type, to have excellent raw-stock storage stability and image storage stability when stored in a stacked state, without reducing sensitivity nor impairing color tone.