发明授权
- 专利标题： Treatment method for diamonds
- 专利标题（中）： 钻石的处理方法
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申请号： US517460申请日： 1995-08-21
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公开(公告)号： US6083354A公开(公告)日： 2000-07-04
- 发明人: Masahiro Deguchi , Makoto Kitabatake , Takashi Hirao
- 申请人： Masahiro Deguchi , Makoto Kitabatake , Takashi Hirao
- 申请人地址： JPX Osaka
- 专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址： JPX Osaka
- 优先权： JPX4-198590 19920724; JPX4-198591 19920724; JPX4-202839 19920730; JPX4-302126 19921112
- 主分类号： C01B31/06
- IPC分类号： C01B31/06 ; C07C1/00 ; C07C2/00 ; C07C4/00 ; C07C5/00
摘要：
The object of the present invention is to provide a treatment method to remove lattice defects and non-diamond elements that exist in a diamond or a diamond thin film.The treatment method whereby the aforementioned object is achieved is to have the diamond or the diamond thin film irradiated by ultra-violet light or heated in an oxygen ambient.According to said treatment method, it has become possible to obtain a diamond or a diamond thin film that is free from the adverse effects of lattice defects and non-diamond elements.
公开/授权文献
- US4988131A Interlocking sections for portable floors and the like 公开/授权日：1991-01-29