发明授权
- 专利标题: Method and device for pre-treatment of substrates
- 专利标题(中): 用于预处理底物的方法和装置
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申请号: US91099申请日: 1998-09-14
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公开(公告)号: US6083356A公开(公告)日: 2000-07-04
- 发明人: Klaus Goedicke , Fred Fietzke , Jonathan Reschke , Wolfgang Hempel , Bert Scheffel , Christoph Metzner , Siegfried Schiller
- 申请人: Klaus Goedicke , Fred Fietzke , Jonathan Reschke , Wolfgang Hempel , Bert Scheffel , Christoph Metzner , Siegfried Schiller
- 申请人地址: DEX Munich
- 专利权人: Fraunhofer-Gesellshaft zur Forderung der angewandten Forschung e.V.
- 当前专利权人: Fraunhofer-Gesellshaft zur Forderung der angewandten Forschung e.V.
- 当前专利权人地址: DEX Munich
- 优先权: DEX19546826 19951215
- 主分类号: C23C14/02
- IPC分类号: C23C14/02 ; H01J37/32 ; B01J19/08
摘要:
Process and apparatus for pre-treatment of a substrate surface in a vacuum by a glow discharge for a subsequent coating process in a vacuum. The process includes maintaining a low pressure glow discharge between the substrate to be pre-treated and a counter-electrode, where the counter-electrode composed of at least a component of the coating to be deposited in the vacuum coating process. The process also includes periodically alternating a polarity of the substrate to act as a cathode or as an anode of the low pressure glow discharge, and individually controlling at least one of pulse length and discharge voltage in both polarities. A frequency of alternation of the polarity is set within a range of between 1 Hz and 1000 kHz. The apparatus includes an evacuatable vacuum chamber, a substrate holder positioned to hold a substrate to be pre-treated, at least one counter-electrode, and an alternating voltage generator coupled to the substrate to be pre-treated and the at least one counter-electrode. The substrate and the counter-electrode are mounted in a potential-free manner.
公开/授权文献
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