发明授权
US6091889A Rapid thermal processor for heating a substrate 有权
用于加热衬底的快速热处理器

Rapid thermal processor for heating a substrate
摘要:
A planar inverted-cone susceptor, preferably made of silicon carbide, inversely disposed between a substrate and a holder of the Rapid Thermal Processor (RTP) so as to perform heat compensation on the substrate. Because the substrate is directly supported by the inverted-cone susceptor, heat stored in the wafer can be rapidly received by the inverted-cone susceptor. Thermal stress and thermal gradient can be effectively decreased in the wafer.
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