发明授权
- 专利标题: Method for fabricating a field emission display
- 专利标题(中): 制造场致发射显示器的方法
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申请号: US648844申请日: 1996-05-15
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公开(公告)号: US6121066A公开(公告)日: 2000-09-19
- 发明人: Byeong Kwon Ju , Myung Hwan Oh , Yun Hi Lee
- 申请人: Byeong Kwon Ju , Myung Hwan Oh , Yun Hi Lee
- 申请人地址: KRX
- 专利权人: Korea Institute of Science and Technology
- 当前专利权人: Korea Institute of Science and Technology
- 当前专利权人地址: KRX
- 优先权: KRX95/42129 19951118
- 主分类号: H01J9/02
- IPC分类号: H01J9/02 ; H01L21/00
摘要:
A field emission display and a method for fabricating the same are disclosed. The method includes the steps of: forming a silicon mold; growing a diamond on the silicon mold, to form a diamond tip; forming a conductive layer on the diamond tip; bonding a first substrate to the conductive layer; removing the silicon mold; forming a gate insulating layer and gate electrode on the diamond tip; and etching the gate electrode and gate insulating layer to expose an electron emission portion of the tip, and thereby form a gate hole. By doing so, the operation voltage is reduced, compared with the diode-type display, and high-responsibility field emission display can be realized by applying (-) or (+) voltage to the gate electrode.
公开/授权文献
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