发明授权
- 专利标题： X-ray mask blank, x-ray mask, and pattern transfer method
- 专利标题（中）： X射线掩模毛坯，X射线掩模和图案转印法
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申请号： US979839申请日： 1997-11-26
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公开(公告)号： US6128363A公开(公告)日： 2000-10-03
- 发明人: Tsutomu Shoki , Takamitsu Kawahara
- 申请人： Tsutomu Shoki , Takamitsu Kawahara
- 申请人地址： JPX Tokyo
- 专利权人： Hoya Corporation
- 当前专利权人： Hoya Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX8-334511 19961129
- 主分类号： G03F1/22
- IPC分类号： G03F1/22 ; G21K1/10 ; H01L21/027 ; H01L21/302 ; H01L21/3065 ; G21K5/00
摘要：
An X-ray mask blank makes it possible to manufacture an X-ray mask which has an extremely low stress, thus providing an extremely high positional accuracy. In the X-ray mask blank, an X-ray transparent film is formed on a substrate, and an X-ray absorber film is formed on the X-ray transparent film. The top and/or the bottom of the X-ray absorber film is provided with a film in which the product of the film stress and the film thickness thereof lies in the range of 0 to .+-.1.times.10.sup.4 dyn/cm.
公开/授权文献
- US5333486A Sheet metal drawing equipment 公开/授权日：1994-08-02
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