发明授权
- 专利标题： Exposure method, exposure device and device producing method
- 专利标题（中）： 曝光方法，曝光装置及装置制作方法
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申请号： US786217申请日： 1997-01-21
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公开(公告)号： US6144719A公开(公告)日： 2000-11-07
- 发明人: Takayuki Hasegawa , Yutaka Tanaka
- 申请人： Takayuki Hasegawa , Yutaka Tanaka
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX8-026263 19960122; JPX8-046875 19960209; JPX8-079623 19960307
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F9/00 ; H01L21/30
摘要：
An exposure method including the steps of providing a wafer and a mask having a membrane and a pattern formed thereon, arranging the mask and the wafer opposite to each other, obtaining information corresponding to deformation of the membrane of the mask, reducing the influence of the deformation of the membrane, and transferring the pattern of the mask to the wafer by exposing the mask to radiant energy. Also disclosed is an exposure device for performing this exposure method.
公开/授权文献
- US5223469A Fluidized-bed catalyst for preparing acrylonitrile 公开/授权日：1993-06-29