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US6145372A Apparatus and method for detecting impurities in wet chemicals 失效
用于检测湿化学品中杂质的装置和方法

Apparatus and method for detecting impurities in wet chemicals
Abstract:
A apparatus and method for monitoring impurities in wet chemicals in semiconductor wafer processing comprising a silicon sensor (12) that is electrically connected to a potentiometer (22), a reference electrode (14) electrically connected to the potentiometer (22), wherein a comparison in the potential between the silicon sensor (12) and the reference electrode (14) to a predetermined baseline is used to measure wet chemical impurities, is disclosed.
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