发明授权
- 专利标题： Thermal barrier coating for silicon nitride
- 专利标题（中）： 氮化硅热障涂层
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申请号： US208109申请日： 1998-11-27
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公开(公告)号： US6159553A公开(公告)日： 2000-12-12
- 发明人: Chien-Wei Li , Thomas Edward Strangman
- 申请人： Chien-Wei Li , Thomas Edward Strangman
- 申请人地址： DC Washington
- 专利权人： The United States of America as represented by the Secretary of the Air Force
- 当前专利权人： The United States of America as represented by the Secretary of the Air Force
- 当前专利权人地址： DC Washington
- 主分类号： C04B41/50
- IPC分类号： C04B41/50 ; C04B41/52 ; C04B41/87 ; C04B41/89 ; C23C4/02 ; C23C24/08 ; C23C28/04 ; B05D3/02 ; C23C4/10
摘要：
A coating of whisker shaped beta silicon nitride grains are formed upon a silicon nitride substrate by sintering over a period of several hours, and the resulting product has a porous reaction bond coating strongly adhered to the silicon nitride substrate.
公开/授权文献
- US5576177A Bioassay for reverse transcriptase inhibitors 公开/授权日：1996-11-19
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