发明授权
- 专利标题： Method of proximity correction with relative segmentation
- 专利标题（中）： 具有相对分割的邻近校正方法
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申请号： US09034550申请日： 1998-03-03
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公开(公告)号： US06174630B1公开(公告)日： 2001-01-16
- 发明人: Dusan Petranovic , Ranko Scepanovic , Edwin Jones , Richard Schinella , Nicholas F. Pasch , Mario Garza , Keith K. Chao , John V. Jensen , Nicholas K. Eib
- 申请人： Dusan Petranovic , Ranko Scepanovic , Edwin Jones , Richard Schinella , Nicholas F. Pasch , Mario Garza , Keith K. Chao , John V. Jensen , Nicholas K. Eib
- 主分类号： G03F900
- IPC分类号： G03F900
摘要：
The present invention is a method and apparatus for applying one-dimensional proximity correction to a piece of a mask pattern, by segmenting a first piece of a mask pattern with horizontal dividing lines into a plurality of segments, segmenting a second piece of said mask pattern with said horizontal dividing lines into a second plurality of segments, and applying proximity correction to a first segment from said first plurality of segments taking into consideration a second segment from said second plurality of segments.