发明授权
US06175122B1 Method for writing a pattern using multiple variable shaped electron beams 失效
使用多个可变形电子束写入图案的方法

Method for writing a pattern using multiple variable shaped electron beams
摘要:
A method of operating multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams; the modified beams are deflected in parallel by the same magnetic field and a uniform transverse electric field to cover a desired area; emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.
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