发明授权
- 专利标题: Method for writing a pattern using multiple variable shaped electron beams
- 专利标题(中): 使用多个可变形电子束写入图案的方法
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申请号: US09004815申请日: 1998-01-09
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公开(公告)号: US06175122B1公开(公告)日: 2001-01-16
- 发明人: Timothy R. Groves , Rodney A. Kendall
- 申请人: Timothy R. Groves , Rodney A. Kendall
- 主分类号: H01J37302
- IPC分类号: H01J37302
摘要:
A method of operating multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams; the modified beams are deflected in parallel by the same magnetic field and a uniform transverse electric field to cover a desired area; emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.
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