发明授权
US06175185B1 Shadow mask for cathode ray tube having non-symmetrical through-holes
失效
具有非对称通孔的阴极射线管阴影掩模
- 专利标题: Shadow mask for cathode ray tube having non-symmetrical through-holes
- 专利标题(中): 具有非对称通孔的阴极射线管阴影掩模
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申请号: US09028658申请日: 1998-02-24
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公开(公告)号: US06175185B1公开(公告)日: 2001-01-16
- 发明人: Nobumitsu Aibara
- 申请人: Nobumitsu Aibara
- 优先权: JP9-041722 19970226
- 主分类号: H01J2980
- IPC分类号: H01J2980
摘要:
A shadow mask for a cathode ray tube includes through-holes defined by first and second recessed formed at first and second surfaces of the shadow mask, respectively. Each through-hole has a first wall farther away from a center of the shadow mask than a second wall thereof. The second recess has a smaller size than that of the first recess. The first wall is formed of a first wall portion defined by an inner surface of the first recess and a second wall portion defined by an inner surface of the second recess. The second wall portion of through-holes located at a peripheral region of the first region has a configuration such that electron beams reflected therefrom are directed to an inner surface of the first recess to thereby reduce electron beams reflected therefrom in directions different from a direction in which the electron beams are originally directed before the electron beams enter the shadow mask.
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