发明授权
US06175185B1 Shadow mask for cathode ray tube having non-symmetrical through-holes 失效
具有非对称通孔的阴极射线管阴影掩模

  • 专利标题: Shadow mask for cathode ray tube having non-symmetrical through-holes
  • 专利标题(中): 具有非对称通孔的阴极射线管阴影掩模
  • 申请号: US09028658
    申请日: 1998-02-24
  • 公开(公告)号: US06175185B1
    公开(公告)日: 2001-01-16
  • 发明人: Nobumitsu Aibara
  • 申请人: Nobumitsu Aibara
  • 优先权: JP9-041722 19970226
  • 主分类号: H01J2980
  • IPC分类号: H01J2980
Shadow mask for cathode ray tube having non-symmetrical through-holes
摘要:
A shadow mask for a cathode ray tube includes through-holes defined by first and second recessed formed at first and second surfaces of the shadow mask, respectively. Each through-hole has a first wall farther away from a center of the shadow mask than a second wall thereof. The second recess has a smaller size than that of the first recess. The first wall is formed of a first wall portion defined by an inner surface of the first recess and a second wall portion defined by an inner surface of the second recess. The second wall portion of through-holes located at a peripheral region of the first region has a configuration such that electron beams reflected therefrom are directed to an inner surface of the first recess to thereby reduce electron beams reflected therefrom in directions different from a direction in which the electron beams are originally directed before the electron beams enter the shadow mask.
信息查询
0/0