发明授权
- 专利标题: Method for forming a conductive focus waffle
- 专利标题(中): 形成导电聚焦华夫饼的方法
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申请号: US09087105申请日: 1998-05-29
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公开(公告)号: US06176754B1公开(公告)日: 2001-01-23
- 发明人: David C. Chang , Arthur J. Learn , Bob L. Mackey , Paul M. Drumm , David L. Morris
- 申请人: David C. Chang , Arthur J. Learn , Bob L. Mackey , Paul M. Drumm , David L. Morris
- 主分类号: H01J916
- IPC分类号: H01J916
摘要:
A conductive focus waffle structure for focusing electrons emitted from a cathode portion of a flat panel display device, and a method for forming the conductive focus waffle structure. In one embodiment, the present invention applies a first layer of photo-imagable material above a cathode portion of a flat panel display device. This embodiment then removes portions of the layer of photo-imagable material such that openings are formed therein. A layer of conductive material is then applied over the cathode such that conductive material is disposed within the openings in the layer of photo-imagable material. A dielectric layer of material is also disposed between the cathode and the bottom surface of the conductive material. This embodiment of the present invention then removes the layer of photo-imagable material such that at least a portion of the conductive focus waffle structure is formed disposed above the cathode. In so doing, at least a first portion of a conductive focus waffle structure having a dielectric bottom portion is formed.
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