发明授权
US06178256B1 Removal of reticle effect on critical dimension by reticle rotation
失效
通过光罩旋转去除关键尺寸上的光罩效应
- 专利标题： Removal of reticle effect on critical dimension by reticle rotation
- 专利标题（中）： 通过光罩旋转去除关键尺寸上的光罩效应
-
申请号： US09201937申请日： 1998-12-01
-
公开(公告)号： US06178256B1公开(公告)日： 2001-01-23
- 发明人: Khanh B. Nguyen , Paul W. Ackmann , Stuart Brown
- 申请人： Khanh B. Nguyen , Paul W. Ackmann , Stuart Brown
- 主分类号： G06K900
- IPC分类号： G06K900
摘要：
A method (200) of characterizing a lithographic printer includes the steps of printing a first and second pattern (202, 228) on substrates (214) using a reticle (220) having a first and second orientation. The method (200) further includes measuring a critical dimension of the first and second pattens at two points (230, 234) and determining an imaging system component of the critical dimension of the patterns at the two points (236). The method (200) may be further expanded to encompass substantially all the points within the image field.
信息查询
