发明授权
- 专利标题： Method for removing microorganism contamination from a polishing slurry
- 专利标题（中）： 从研磨浆中除去微生物污染物的方法
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申请号： US09415126申请日： 1999-10-08
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公开(公告)号： US06183652B2公开(公告)日： 2001-02-06
- 发明人: Annette Margaret Crevasse , William Graham Easter , John Albert Maze , Frank Miceli
- 申请人： Annette Margaret Crevasse , William Graham Easter , John Albert Maze , Frank Miceli
- 主分类号： C02F148
- IPC分类号： C02F148
摘要：
A method for removing microorganism contamination from a polishing slurry used for chemical mechanical polishing operations in the semiconductor manufacturing industry includes treating a slurry stream with ultraviolet (uv) energy to destroy the microorganisms, then filtering the uv-treated stream to remove the destroyed microorganisms before the slurry is delivered to the polishing apparatus.
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