发明授权
- 专利标题： Exposure apparatus and image formation apparatus
- 专利标题（中）： 曝光装置和图像形成装置
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申请号： US09157492申请日： 1998-09-21
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公开(公告)号： US06184971B2公开(公告)日： 2001-02-06
- 发明人: Izumi Narita , Kenji Muto
- 申请人： Izumi Narita , Kenji Muto
- 优先权： JP9-278010 19970926; JP9-345448 19971215; JP10-255140 19980909
- 主分类号： G03B2754
- IPC分类号： G03B2754
摘要：
A high-quality image is formed by using light emission element arrays of plural lines. The plural light emission element arrays are arranged substantially in parallel, an area of a light emission part of each array being different from others, respective light emission elements in the light emission element arrays are caused to selectively perform light emission according to gradation data, and the respective light emission element arrays overlappingly perform exposure on a relatively moved photosensitive body.