A pulse waveform is provided to at least one surface of an implantable device to protect it from corrosion from a corrosive fluid. The pulse waveform can be delivered through ether anodic or cathodic monophasic or asymetrical biphasic pulses using one electrode and an indiferent or sacrificial electrode. The electrode and the indiferent or sacrificial electrode are oriented such that a closed circuit between the two electrodes is completed through the corrosive fluid and the surface to be protected is within the completed circuit path.