发明授权
- 专利标题: Process for forming thin films of functional ceramics
- 专利标题(中): 形成功能性陶瓷薄膜的方法
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申请号: US09161308申请日: 1998-09-28
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公开(公告)号: US06190728B1公开(公告)日: 2001-02-20
- 发明人: Hisao Suzuki , Tomio Hirano , Tatsuya Wada
- 申请人: Hisao Suzuki , Tomio Hirano , Tatsuya Wada
- 优先权: JP9-279418 19970929
- 主分类号: B05D512
- IPC分类号: B05D512
摘要:
A process for forming a functional ceramic thin film eliminating the need of high temperature annealing which has been indispensable in the conventional process is provided. This can be achieved by the process for forming a functional ceramic thin film having a crystal of a composite oxide consisting of two or more metal elements and oxygen, which comprises steps of alternately stacking seeding layers having the same crystalline structure as said composite oxide and formable at a temperature lower than the crystallization temperature of the composite oxide, and layers containing a larger amount of a specified metal element than said seeding layers, and then annealing the resultant layers to form an integral body.
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