发明授权
- 专利标题: Hydrolyzed water-resistant protective overcoat for an imaging element
- 专利标题(中): 用于成像元件的水解防水保护外套
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申请号: US09547374申请日: 2000-04-11
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公开(公告)号: US06190843B1公开(公告)日: 2001-02-20
- 发明人: Hwei-Ling Yau , Thomas H. Whitesides , Elmer C. Flood , Amy E. Jasek
- 申请人: Hwei-Ling Yau , Thomas H. Whitesides , Elmer C. Flood , Amy E. Jasek
- 主分类号: G03C176
- IPC分类号: G03C176
摘要:
The present invention relates to imaging elements, including photographic elements and recording media, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a processing-solution-permeable protective overcoat that is water resistant in the final processed product. The overcoat, before formation of the image, comprises hydrophobic polymeric particles in a gelatin matrix. Subsequent treatment of the overcoat, after formation of the image, to remove the gelatin, causes coalescence of the hydrophobic particles, resulting in the formation of a water-resistant continuous protective overcoat.
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