发明授权
US06194620B1 Dichloro tetraflouro-{2,2}-paracyclopane, a process for manufacturing thereof and poly-&agr;, &agr;-difluoro-chloro-para-xylylene film prepared therefrom
失效
二氯 - 四氟 - {2,2} - 对环烷烃，其制备方法和由其制备的聚-α-，a-二氟 - 氯 - 对二甲苯膜
- 专利标题： Dichloro tetraflouro-{2,2}-paracyclopane, a process for manufacturing thereof and poly-&agr;, &agr;-difluoro-chloro-para-xylylene film prepared therefrom
- 专利标题（中）： 二氯 - 四氟 - {2,2} - 对环烷烃，其制备方法和由其制备的聚-α-，a-二氟 - 氯 - 对二甲苯膜
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申请号： US08789012申请日： 1997-01-27
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公开(公告)号： US06194620B1公开(公告)日： 2001-02-27
- 发明人: Hiroshi Maruyama
- 申请人： Hiroshi Maruyama
- 主分类号： C07C1908
- IPC分类号： C07C1908
摘要：
Dichloro-tetrafluoro-[2,2]-paracyclophane (formula I), which is a novel compound useful as a material for forming a coating film by chemical vapor deposition, and a process for manufacturing thereof and poly-&agr;&agr;-difluoro-chloro-para-xylylene film prepared therefrom are disclosed. Dichloro-tetrafluoro-[2,2]-paracyclophane is manufactured by chlorinating tetrafluoro-[2,2]-paracyclophane. The film to be formed by chemical vapor deposition of dichloro-tetrafluoro-[2,2]-paracyclophane has remarkably improved thermostability, as compared with the conventional products and is expected to be applied in various fields.
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