发明授权
- 专利标题: Electrochemical stain prevention apparatus of submerged structure and process for producing submerged structure used in this apparatus
- 专利标题(中): 本装置中使用的浸没式结构的电化学防污染装置及其制造方法
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申请号: US09426658申请日: 1999-10-25
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公开(公告)号: US06197168B1公开(公告)日: 2001-03-06
- 发明人: Tadashi Matsunaga , Tsuruo Nakayama , Hitoshi Wake , Kin-ichi Ozawa , Noriyuki Nakamura , Nobuyuki Murakami , Hiromichi Takahashi , Toshihiro Takimoto , Hideo Kadoi
- 申请人: Tadashi Matsunaga , Tsuruo Nakayama , Hitoshi Wake , Kin-ichi Ozawa , Noriyuki Nakamura , Nobuyuki Murakami , Hiromichi Takahashi , Toshihiro Takimoto , Hideo Kadoi
- 优先权: JP10-062159 19980226; JP10-084953 19980316; JP10-136039 19980430; JP10-164229 19980528; JP10-196677 19980626
- 主分类号: C23F1300
- IPC分类号: C23F1300
摘要:
An electrochemical stain prevention apparatus of a submerged structure comprising a submerged structure of which at least the stain prevention surface is formed of a conductive film that does not generate chlorine even by applying a potential of 5 V vs. SCE or less, a counter electrode located so as not to contact with the submerged structure, and a power supply unit for passing a direct current through the submerged structure having the conductive film formed thereon and the counter electrode. Aquatic organisms adhered to the surface of the conductive film can effectively be controlled by applying a potential of from 0.1 to 5 V vs. SCE to the submerged structure of such a stain prevention apparatus without generating chlorine. A potential applied to the conductive film of the submerged structure can be controlled with good accuracy by disposing a reference electrode between the submerged structure and the counter electrode. As the conductive film formed on the substrate of the submerged structure, a sprayed coating film made of a metal nitride can preferably be used.
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