发明授权
US06218717B1 Semiconductor pressure sensor and manufacturing method therefof 有权
半导体压力传感器及其制造方法

  • 专利标题: Semiconductor pressure sensor and manufacturing method therefof
  • 专利标题(中): 半导体压力传感器及其制造方法
  • 申请号: US09231799
    申请日: 1999-01-15
  • 公开(公告)号: US06218717B1
    公开(公告)日: 2001-04-17
  • 发明人: Inao ToyodaHiroaki TanakaNoboru Endo
  • 申请人: Inao ToyodaHiroaki TanakaNoboru Endo
  • 优先权: JP10-006905 19980116
  • 主分类号: H01L2982
  • IPC分类号: H01L2982
Semiconductor pressure sensor and manufacturing method therefof
摘要:
A semiconductor pressure sensor includes a semiconductor substrate having a diaphragm portion. A diaphragm formation region including the diaphragm portion is electrically insulated from a peripheral region therearound. Voltage is applied to the diaphragm formation region via a pad and a wire both formed on a surface of the semiconductor substrate, for fixing a potential of the diaphragm formation region when the sensor is put in an operating state. The fixed potential is set to be equal to or higher than a maximum potential of a gauge diffusion resistive layer formed in the diaphragm formation region. As a result, even when the maximum potential of the gauge diffusion resistive layer is a power supply voltage, it can be prevented that current leaks from the gauge diffusion resistive layer.
信息查询
0/0