发明授权
- 专利标题: Semiconductor pressure sensor and manufacturing method therefof
- 专利标题(中): 半导体压力传感器及其制造方法
-
申请号: US09231799申请日: 1999-01-15
-
公开(公告)号: US06218717B1公开(公告)日: 2001-04-17
- 发明人: Inao Toyoda , Hiroaki Tanaka , Noboru Endo
- 申请人: Inao Toyoda , Hiroaki Tanaka , Noboru Endo
- 优先权: JP10-006905 19980116
- 主分类号: H01L2982
- IPC分类号: H01L2982
摘要:
A semiconductor pressure sensor includes a semiconductor substrate having a diaphragm portion. A diaphragm formation region including the diaphragm portion is electrically insulated from a peripheral region therearound. Voltage is applied to the diaphragm formation region via a pad and a wire both formed on a surface of the semiconductor substrate, for fixing a potential of the diaphragm formation region when the sensor is put in an operating state. The fixed potential is set to be equal to or higher than a maximum potential of a gauge diffusion resistive layer formed in the diaphragm formation region. As a result, even when the maximum potential of the gauge diffusion resistive layer is a power supply voltage, it can be prevented that current leaks from the gauge diffusion resistive layer.