发明授权
- 专利标题: Polishing apparatus
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申请号: US09296567申请日: 1999-04-22
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公开(公告)号: US06220945B1公开(公告)日: 2001-04-24
- 发明人: Kazuto Hirokawa , Hirokuni Hiyama , Yutaka Wada , Hisanori Matsuo
- 申请人: Kazuto Hirokawa , Hirokuni Hiyama , Yutaka Wada , Hisanori Matsuo
- 优先权: JP10-114852 19980424; JP11-086872 19990329
- 主分类号: B24B2900
- IPC分类号: B24B2900
摘要:
A polishing apparatus comprises a polishing member that has a wide stable polishing range to perform effective polishing, even if a rotation axis moves away from the edge of a workpiece. A polishing member holder holds the polishing member, and a workpiece holder holds the workpiece to be polished. A drive device produces a relative sliding motion between the polishing member and the workpiece. At least one holder of either the polishing member holder or the workpiece holder is rotatable about a rotation axis and is tiltable with respect to other holder. Such one holder is provided with a pressing mechanism to stabilize orientation or desired posture of the one holder by applying an adjusting pressure to the one holder at a location away from the rotation axis.
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