发明授权
- 专利标题： Film deposition apparatus
- 专利标题（中）： 膜沉积装置
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申请号： US09110124申请日： 1998-07-06
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公开(公告)号： US06223684B1公开(公告)日： 2001-05-01
- 发明人: Yasushi Fujioka , Masahiro Kanai , Yasuyoshi Takai
- 申请人： Yasushi Fujioka , Masahiro Kanai , Yasuyoshi Takai
- 优先权： JP9-196585 19970707; JP10-199869 19980630
- 主分类号： C23C1600
- IPC分类号： C23C1600
摘要：
A film deposition apparatus includes a vacuum chamber, a gas supplier, a gas exhauster, and a discharging means, the film deposition apparatus forming a deposited film on a substrate provided in the vacuum chamber by a plasma enhanced CVD process, wherein at least one louver is provided at the interior and/or vicinity of the plasma discharging space in the vacuum chamber.
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