发明授权
US06228435B1 Process for treating base to selectively impart water repellency, light-shielding member formed substrate, and production process of color filter substrate for picture device
失效
碱处理工艺以选择性地赋予防水性，遮光构件形成的基材，以及用于图像装置的滤色器基板的制造方法
- 专利标题： Process for treating base to selectively impart water repellency, light-shielding member formed substrate, and production process of color filter substrate for picture device
- 专利标题（中）： 碱处理工艺以选择性地赋予防水性，遮光构件形成的基材，以及用于图像装置的滤色器基板的制造方法
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申请号： US08677739申请日： 1996-07-10
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公开(公告)号： US06228435B1公开(公告)日： 2001-05-08
- 发明人: Toshiaki Yoshikawa , Makoto Kameyama , Hiroyuki Suzuki , Nagato Osano , Hirohide Matsuhisa , Kenichi Iwata
- 申请人： Toshiaki Yoshikawa , Makoto Kameyama , Hiroyuki Suzuki , Nagato Osano , Hirohide Matsuhisa , Kenichi Iwata
- 优先权： JP7-178999 19950714
- 主分类号： C08F246
- IPC分类号： C08F246
摘要：
Disclosed herein is a process for producing a color filter substrate for picture device constructed by selectively arranging light-shielding members and a plurality of coloring members different in spectral characteristics from each other on a transparent base, which comprises the steps of forming a water-repellent layer composed of a silane coupling agent on the base on which the light-shielding members are partially formed, exposing the surface of the base to oxygen plasma, and arranging a plurality of the coloring members different in spectral characteristics from each other on transparent regions of the base.