发明授权
- 专利标题： Refrigerant mixture substitute for chlorodifluoromethane
- 专利标题（中）： 制冷剂混合物代替氯二氟甲烷
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申请号： US09410058申请日： 1999-10-01
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公开(公告)号： US06231780B1公开(公告)日： 2001-05-15
- 发明人: Byung Gwon Lee , Jong Sung Lim , Kun You Park , Byoung Sung Ahn , Sang Deuk Lee
- 申请人： Byung Gwon Lee , Jong Sung Lim , Kun You Park , Byoung Sung Ahn , Sang Deuk Lee
- 优先权： KR98-57664 19981223
- 主分类号： C09K504
- IPC分类号： C09K504
摘要：
A refrigerant composition useful as a substitute for chlorodifluoromethane (CHCIF2, HCFC-22). The refrigerant mixture has a first constituent of difluoromethane (CH2F2, HFC-32); a second constituent selected from perfluoropropane (C3F8, PFC-218), cyclopropane (C3H6, RC-270) and butane (C4H10, R-600); and a third constituent selected from 1,1-difluoroethane (CH3CHF2, HFC-152a), 1,1,1,2,2-pentafluoropropane (CH3CF2CF3, HFC-245cb) and bis(difluoromethyl)ether (CHF2OCHF2, HFE-134).