发明授权
- 专利标题: Method of producing a ferroelectric thin film coated substrate
- 专利标题(中): 制造铁电薄膜被覆基板的方法
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申请号: US08968938申请日: 1997-11-12
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公开(公告)号: US06232167B1公开(公告)日: 2001-05-15
- 发明人: Sakiko Satoh , Takeshi Kijima , Hironori Matsunaga , Masayoshi Koba
- 申请人: Sakiko Satoh , Takeshi Kijima , Hironori Matsunaga , Masayoshi Koba
- 优先权: JP7-168119 19950609
- 主分类号: H01L218242
- IPC分类号: H01L218242
摘要:
A ferroelectric thin film coated substrate is obtained by a producing method of forming a crystalline thin film on a substrate by means of a MOCVD method at a substrate temperature at which crystal grows and of forming a ferroelectric thin film on the crystalline thin film by means of the MOCVD method at a film forming temperature, which is lower than the film forming temperature of the crystalline thin film. This producing method makes it possible to produce a ferroelectric thin film, where a surface of the thin film is dense and even, leakage current properties are excellent and sufficiently large remanent spontaneous polarization is shown, at a lower temperature.
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