- 专利标题: Lithography using quantum entangled particles
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申请号: US09393451申请日: 1999-09-10
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公开(公告)号: US06252665B1公开(公告)日: 2001-06-26
- 发明人: Colin Williams , Jonathan Dowling
- 申请人: Colin Williams , Jonathan Dowling
- 主分类号: G01B902
- IPC分类号: G01B902
摘要:
A system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.
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