发明授权
- 专利标题: Copper base alloys and terminals using the same
- 专利标题(中): 铜基合金和使用其的端子
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申请号: US09379951申请日: 1999-08-24
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公开(公告)号: US06254702B1公开(公告)日: 2001-07-03
- 发明人: Yoshitake Hana , Akira Sugawara , Takayoshi Endo
- 申请人: Yoshitake Hana , Akira Sugawara , Takayoshi Endo
- 优先权: JP9/072594 19970218
- 主分类号: C22C902
- IPC分类号: C22C902
摘要:
A copper alloy for terminals of the Cu—Ni—Sn—P system or Cu—Ni—Sn—P—Zn system and that has a tensile strength of at least 500 N/mm2, a spring limit of at least 400 N/mm2, a stress relaxation of no more than 10%, a conductivity of at least 30% IACS and a bending workability in terms of a R/t ratio of no more than 2. The spring portion or the entire part of such terminals are produced from the copper alloy, and have an initial insertion/extraction force of 1.5 N to 30 N and a resistance of no more than 3 m&OHgr; at low voltage and low current as initial performance. The terminals experience not more than 20% stress relaxation. The alloy is superior to the conventional bronze, phosphor bronze and Cu—Sn—Fe—P alloys for terminals in terms of tensile strength, spring limit, stress relaxation characteristics and conductivity and, hence, the terminals manufactured from such alloys have higher performance and reliability than terminals made of the conventional copper alloys for terminals.
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