Invention Grant
- Patent Title: Quality control plasma monitor for laser shock processing
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Application No.: US09256333Application Date: 1999-02-19
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Publication No.: US06254703B1Publication Date: 2001-07-03
- Inventor: David W. Sokol , Craig T. Walters , Harold M. Epstein , Allan H. Clauer , Jeffrey L. Dulaney , Mark O'Loughlin
- Applicant: David W. Sokol , Craig T. Walters , Harold M. Epstein , Allan H. Clauer , Jeffrey L. Dulaney , Mark O'Loughlin
- Main IPC: C21D154
- IPC: C21D154
![Quality control plasma monitor for laser shock processing](/abs-image/US/2001/07/03/US06254703B1/abs.jpg.150x150.jpg)
Abstract:
A method and apparatus for quality control of laser shock processing. The method includes measuring emissions and characteristics of a workpiece when subjected to a pulse of coherent energy from a laser. These empirically measured emissions and characteristics of the workpiece are correlated to theoretical shock pressure, residual stress profile, or fatigue life of the workpiece. The apparatus may include a radiometer or acoustic detection device for measuring these characteristics.
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