- 专利标题: Quality control plasma monitor for laser shock processing
-
申请号: US09256333申请日: 1999-02-19
-
公开(公告)号: US06254703B1公开(公告)日: 2001-07-03
- 发明人: David W. Sokol , Craig T. Walters , Harold M. Epstein , Allan H. Clauer , Jeffrey L. Dulaney , Mark O'Loughlin
- 申请人: David W. Sokol , Craig T. Walters , Harold M. Epstein , Allan H. Clauer , Jeffrey L. Dulaney , Mark O'Loughlin
- 主分类号: C21D154
- IPC分类号: C21D154
摘要:
A method and apparatus for quality control of laser shock processing. The method includes measuring emissions and characteristics of a workpiece when subjected to a pulse of coherent energy from a laser. These empirically measured emissions and characteristics of the workpiece are correlated to theoretical shock pressure, residual stress profile, or fatigue life of the workpiece. The apparatus may include a radiometer or acoustic detection device for measuring these characteristics.
信息查询