发明授权
- 专利标题： Polyamide resin composition and process for producing the same
- 专利标题（中）： 聚酰胺树脂组合物及其制造方法
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申请号： US09403694申请日： 1999-10-25
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公开(公告)号： US06255378B1公开(公告)日： 2001-07-03
- 发明人: Koji Fujimoto , Tsuneo Tamura , Kazushige Kojima , Sachiko Kokuryo , Izumi Yoshida
- 申请人： Koji Fujimoto , Tsuneo Tamura , Kazushige Kojima , Sachiko Kokuryo , Izumi Yoshida
- 优先权： JP9-108654 19970425; JP9-136411 19970527; JP9-251728 19970917; JP9-259593 19970925
- 主分类号： C08K334
- IPC分类号： C08K334
摘要：
The present invention provides a polyamide resin composition in which silicate layers originating from a layered silicate and having the below-described property {circle around (1)} are uniformly dispersed on a molecular level in a polyamide resin to accomplish high strength, high modulus, high heat resistance, high toughness, excellent dimensional stability, and high tensile elongation with a small deviation. {circle around (1)}: average particle size from a photograph observation of transmission electron microscopy is 0.1 &mgr;m or less and not including a maximum particle size of 30 &mgr;m or higher.
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