发明授权
- 专利标题： Process for imaging of photoresist
- 专利标题（中）： 光刻胶成像工艺
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申请号： US08345290申请日： 1994-11-28
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公开(公告)号： US06277546B1公开(公告)日： 2001-08-21
- 发明人: Gregory Breyta , Nicholas Jeffries Clecak , William Dinan Hinsberg, III , Donald Clifford Hofer , Hiroshi Ito , Scott Arthur MacDonald , Ratnam Sooriyakumaran
- 申请人： Gregory Breyta , Nicholas Jeffries Clecak , William Dinan Hinsberg, III , Donald Clifford Hofer , Hiroshi Ito , Scott Arthur MacDonald , Ratnam Sooriyakumaran
- 主分类号： G03F726
- IPC分类号： G03F726
摘要：
The present invention relates to an improved lithographic imaging process for use in the manufacture of integrated circuits. The process provides protection to the photoresist film from airborne chemical contaminants.
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