An apparatus for manufacturing a silica film is provided. The apparatus includes a conveyor including a mounting unit where a plurality of wafers are loaded. The conveyor is used for moving and transferring the mounting wafers. The apparatus also includes a deposition part for generating flames to deposit silica soot on the plurality of wafers, the deposition part being located above the conveyor, and a calcination part, adjacent to the deposition part, removing water from the silica soot, and a sintering part, adjacent to the calcination part, for deifying the calcined silica soot to form a silica film. The process of manufacturing the silica film can be continuously performed, enhancing productivity.