发明授权
- 专利标题： Processing apparatus for coating substrate with resist and developing exposed resist including inspection equipment for inspecting substrate and processing method thereof
- 专利标题（中）： 用抗蚀剂涂布基材的处理装置和显影曝光抗蚀剂，包括用于检查基板的检查设备及其加工方法
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申请号： US09465681申请日： 1999-12-17
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公开(公告)号： US06281962B1公开(公告)日： 2001-08-28
- 发明人: Kunie Ogata , Koki Nishimuko
- 申请人： Kunie Ogata , Koki Nishimuko
- 优先权： JP10-375580 19981217
- 主分类号： G03B2732
- IPC分类号： G03B2732
摘要：
Inspection equipment for detecting defects in a wafer is provided in a coating and developing system including a plurality of kinds of processing units for performing processing necessary for coating a wafer with a resist and processing necessary for developing the resist on the wafer. The transfer of the wafer between the processing units and the inspection equipment is performed by means of a main transfer device. The inspection equipment sends an inspection result as a detection signal to a controller, and the controller which receives the detection signal controls exposure conditions for an aligner according to the presence or absence of defects and adjusts a frequency regulating mechanism to control inspection frequency. The wafer is transferred between the processing units and the inspection equipment by the main transfer device, whereby the wafer is not artificially contaminated.
信息查询
