发明授权
US06284445B1 Reference calibration patch arrangement to minimize exposure and measurement artifacts and maximize robustness to defects
失效
参考校准贴片布置，以最小化曝光和测量伪影，并最大限度地提高缺陷的鲁棒性
- 专利标题： Reference calibration patch arrangement to minimize exposure and measurement artifacts and maximize robustness to defects
- 专利标题（中）： 参考校准贴片布置，以最小化曝光和测量伪影，并最大限度地提高缺陷的鲁棒性
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申请号： US09635257申请日： 2000-08-09
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公开(公告)号： US06284445B1公开(公告)日： 2001-09-04
- 发明人: John T. Keech , Donald O. Bigelow , Nathan D. Cahill , Thomas F. Powers , John P. Spence
- 申请人： John T. Keech , Donald O. Bigelow , Nathan D. Cahill , Thomas F. Powers , John P. Spence
- 主分类号： G03C100
- IPC分类号： G03C100
摘要：
Reference calibration patches produced by a sequence of exposures on a photographic element, the photographic element exhibiting linear defects in a predominant direction, are arranged in a two dimensional array and exposures are assigned to the reference calibration patches in the array such that nearest neighbors in the predominant direction are not nearest neighbors in the exposure sequence, whereby the effects of a linear defect are reduced; and the maximum number of steps in the exposure sequence between a reference calibration patch and that of its nearest neighbors in any direction is less than a predetermined number, whereby the effects of flare are reduced.
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