发明授权
- 专利标题： Composition for the controlled release of chlorine dioxide gas
- 专利标题（中）： 用于控制二氧化氯气体的组成
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申请号： US09407519申请日： 1999-09-28
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公开(公告)号： US06294108B1公开(公告)日： 2001-09-25
- 发明人: Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
- 申请人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
- 主分类号： C01B1102
- IPC分类号： C01B1102
摘要：
Method, composition and system for generating chlorine dioxide gas in a controlled release manner by combining at least one metal chlorite and a dry solid hydrophilic material that reacts with the metal chlorite in the presence of water vapor, but does not react with the metal chlorite in the substantial absence of liquid water or water vapor to produce chlorine dioxide gas in a sustained amount of from about 0.001 to 1,000 ppm.