发明授权
- 专利标题： Lithographic printing plate having high chemical resistance
- 专利标题（中）： 平版印刷版具有高耐化学腐蚀性
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申请号： US09469493申请日： 1999-12-22
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公开(公告)号： US06294311B1公开(公告)日： 2001-09-25
- 发明人: Ken-ichi Shimazu , Jayanti Patel , Jianbing Huang , Nishith Merchant , Mathias Jarek
- 申请人： Ken-ichi Shimazu , Jayanti Patel , Jianbing Huang , Nishith Merchant , Mathias Jarek
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
Imageable elements useful as lithographic printing members are disclosed. The elements contain a substrate, an underlayer, and a top layer. The underlayer contains a combination of polymeric materials that provides resistance both to fountain solution and to aggressive washes, such as a UV wash. The underlayer can be used in either thermally imageable or photochemically imageable elements.
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