发明授权
- 专利标题： Lithographic base for use in non-impact printing
- 专利标题（中）： 用于非冲击印刷的平版印刷底座
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申请号： US09409882申请日： 1999-10-01
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公开(公告)号： US06295927B1公开(公告)日： 2001-10-02
- 发明人: Eric Verschueren
- 申请人： Eric Verschueren
- 优先权： EP98203608 19981026
- 主分类号： B41N300
- IPC分类号： B41N300
摘要：
According to the present invention there is provided a lithographic base including a support and a hydrophilic cross-linked layer having a total volume of pores of more than 0.0007 cm3/g of the lithographic base. The hydrophilic cross-linked layer contains a hydrophilic binder, TiO2 particles and a low molecular weight polyhydric alcohol or a liquid amide as a drying control chemical additive.
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