发明授权
US06296780B1 System and method for etching organic anti-reflective coating from a substrate
失效
用于从衬底蚀刻有机抗反射涂层的系统和方法
- 专利标题: System and method for etching organic anti-reflective coating from a substrate
- 专利标题(中): 用于从衬底蚀刻有机抗反射涂层的系统和方法
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申请号: US08986427申请日: 1997-12-08
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公开(公告)号: US06296780B1公开(公告)日: 2001-10-02
- 发明人: Chun Yan , Yan Ye , Diana Ma
- 申请人: Chun Yan , Yan Ye , Diana Ma
- 主分类号: H01L213213
- IPC分类号: H01L213213
摘要:
The present invention is embodied in a method and apparatus for etching an organic anti-reflective coating (OARC) layer and a titanium nitride anti-reflective coating (TiN ARC) layer deposited on a substrate located within a processing chamber, without the need for removing the substrate being processed from the processing chamber in which it is situated and without the need for intervening processing steps, such as chamber cleaning operations. The substrate has a base, an underlying oxide layer above the base, an overlying layer above the underlying layer, a middle conductive layer, a TiN ARC layer, and a top OARC layer spun on top of the TiN ARC.