发明授权
- 专利标题: Wafer edge scrubber and method
- 专利标题(中): 晶圆边洗涤器和方法
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申请号: US09113447申请日: 1998-07-10
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公开(公告)号: US06299698B1公开(公告)日: 2001-10-09
- 发明人: Ramin Emami , Brian J. Brown
- 申请人: Ramin Emami , Brian J. Brown
- 主分类号: B08B104
- IPC分类号: B08B104
摘要:
An inventive brush and scrubbing device is provided for simultaneously scrubbing both planar and profiled (e.g., edge) surfaces of a thin disk such as a semiconductor wafer. The inventive brush has a contact surface having two portions, a planar portion for contacting a planar surface of a wafer, and a profiled portion for contacting an edge surface of a wafer. The profile of the profiled portion preferably follows the edge profile of a wafer to be cleaned by the brush. The profiled portion may have a higher modulus of elasticity than does the planar portion. Preferably the brushes are roller type PVA brushes having a plurality of nodules formed thereon.
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