发明授权
US06299698B1 Wafer edge scrubber and method 失效
晶圆边洗涤器和方法

  • 专利标题: Wafer edge scrubber and method
  • 专利标题(中): 晶圆边洗涤器和方法
  • 申请号: US09113447
    申请日: 1998-07-10
  • 公开(公告)号: US06299698B1
    公开(公告)日: 2001-10-09
  • 发明人: Ramin EmamiBrian J. Brown
  • 申请人: Ramin EmamiBrian J. Brown
  • 主分类号: B08B104
  • IPC分类号: B08B104
Wafer edge scrubber and method
摘要:
An inventive brush and scrubbing device is provided for simultaneously scrubbing both planar and profiled (e.g., edge) surfaces of a thin disk such as a semiconductor wafer. The inventive brush has a contact surface having two portions, a planar portion for contacting a planar surface of a wafer, and a profiled portion for contacting an edge surface of a wafer. The profile of the profiled portion preferably follows the edge profile of a wafer to be cleaned by the brush. The profiled portion may have a higher modulus of elasticity than does the planar portion. Preferably the brushes are roller type PVA brushes having a plurality of nodules formed thereon.
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